Калибровка растровых электронных микроскопов в широком диапазоне увеличений

Abstract

We propose a new method of calibration of SEM magnification in the range of from 10 to 50 000X using the gage block of 4 mm size and auxiliary structure. Auxiliary structure was made as relief structure on the silicon chip and comprises two pitch structures of 100 mm and 2 mm pitch value provided that total length of the first pitch structure is 4mm. The use of verified gage block assures traceability of calibration results to the primary standard of meter. Expanded uncertainty of our measurements for 1K, 10K and 50K magnification calibration is not more than 0,14% for SEM S-4800.